World’s first 1-nanometre RISC-V chip made in China with 2D materials - South China Morning Post

World’s first 1-nanometre RISC-V chip made in China with 2D materials - South China Morning Post

Abstract

Researchers in China have reportedly created the world's first chip operating at an unprecedented 1-nanometre scale. This radical miniaturization was achieved by utilizing advanced 2D materials, surpassing the limitations of conventional silicon semiconductor fabrication. The prototype integrates the open-source RISC-V instruction set architecture, signaling a major breakthrough in materials science and next-generation computing hardware.

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Structured Report

Key Highlights

  • Record Scaling: The reported chip achieves a world-first process node of 1-nanometre (1nm), drastically smaller than current commercial standards.
  • Novel Materials: The breakthrough relies critically on the incorporation of 2D materials, which enable transistor functionality and mitigate short-channel effects at ultra-small dimensions.
  • RISC-V Integration: The chip utilizes the open-source RISC-V Instruction Set Architecture (ISA).
  • Chinese Innovation: The technology was developed and fabricated by research teams in China, underscoring domestic advancement in fundamental semiconductor research.

Technical Details

  • Process Node: 1 nm (representing the physical gate length or equivalent process density, placing it far ahead of current 3nm/2nm commercial limits).
  • Materials: The innovation hinges on advanced 2D materials (such as molybdenum disulfide or related compounds) which can be made into ultrathin films, necessary for viable transistor operation below 2nm.
  • Architecture: RISC-V ISA, chosen likely for its modularity and suitability for custom, experimental hardware design.
  • Goal: To demonstrate a proof-of-concept processor that overcomes the physical and electrical barriers encountered by traditional silicon FinFET architecture at atomic scales.

Implications

  • Post-Silicon Era Paving: This breakthrough potentially validates 2D materials as the critical successor technology required to continue Moore's Law scaling well into the future, enabling the post-silicon era of computing.
  • Advancement in RISC-V Ecosystem: Implementing such cutting-edge material science on the RISC-V architecture reinforces the ISA's position as the leading platform for next-generation, high-performance, and custom hardware development.
  • Geopolitical Significance: This achievement highlights China's growing self-reliance and significant investment in foundational semiconductor research, particularly in materials science where it can bypass reliance on traditional Western lithography equipment.
  • Potential for Performance: If successfully commercialized or scaled, this 1nm technology could yield unprecedented transistor density and power efficiency gains, fundamentally redefining the capabilities of computing devices.
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